The electronic Nitrogen Trifluoride (NF3) is one of excellent plasma etching gas which characterized with perfect etching rate and selectivity. Therefore, the etching surface does not have any residue which is very well cleaner.
The main purpose of Nitrogen Trifluoride (NF3) is as follows.
1. It is as fluorine source of high-energy chemical laser gas.
2. It could be the Etchant and Clearer in Electronics Industry (Integrated Circuit).
3. It applies to the Photovoltaic Industry.
4. Producing Perfluoro Ammonium could be filling gas to extend the life of lamp and increase brightness, also it could be oxidizer in mining and rocket technology.
The electronic of our Nitrogen Trifluoride (NF3) is 4N8 Grade and 4N6 Grade.
If you need the details of these specifications, please do not hesitate to contact with us, thank you.
